TEL Tokyo Electron 2L80-000212-13驅(qū)動(dòng)器 PDF資料
1.產(chǎn) 品 資 料 介 紹:
中文資料:
TEL Tokyo Electron 2L80-000212-13 驅(qū)動(dòng)器模塊
類型:執(zhí)行單元控制驅(qū)動(dòng)器(Driver Module / Actuator Driver)
制造商:Tokyo Electron Ltd.(TEL)
一、產(chǎn)品功能概述
2L80-000212-13 驅(qū)動(dòng)器 是用于半導(dǎo)體設(shè)備中執(zhí)行部件(如馬達(dá)、電磁閥、線性執(zhí)行器等)的控制模塊。它主要執(zhí)行以下功能:
接收主控制系統(tǒng)或嵌入式處理器發(fā)出的控制信號(hào)
放大控制信號(hào)以驅(qū)動(dòng)高功率負(fù)載(如伺服電機(jī)、步進(jìn)電機(jī))
提供精確的速度控制、位置控制或力矩控制
實(shí)現(xiàn)閉環(huán)反饋控制,與傳感器模塊協(xié)同運(yùn)行
具備電氣保護(hù)功能,如過(guò)載、過(guò)壓、過(guò)流保護(hù)
二、典型應(yīng)用領(lǐng)域
1. 晶圓搬運(yùn)系統(tǒng)(Wafer Transfer Module)
驅(qū)動(dòng)真空機(jī)械手、旋轉(zhuǎn)臂、Z軸升降平臺(tái)等裝置
實(shí)現(xiàn)晶圓精準(zhǔn)搬運(yùn)、對(duì)位、裝載與卸載
2. 真空腔體動(dòng)作控制系統(tǒng)
控制真空閥門的開關(guān)動(dòng)作、定位機(jī)構(gòu)或腔體門的驅(qū)動(dòng)電機(jī)
支持多點(diǎn)定位與閉環(huán)反饋,提升腔體安全性和可靠性
3. 化學(xué)氣相沉積(CVD)或刻蝕系統(tǒng)中的閥控驅(qū)動(dòng)
驅(qū)動(dòng)氣體比例控制閥、電磁閥或切換閥
精準(zhǔn)調(diào)節(jié)氣體流量、配比與響應(yīng)時(shí)序
4. 冷卻或加熱平臺(tái)驅(qū)動(dòng)裝置
驅(qū)動(dòng)熱沉、冷板調(diào)節(jié)組件或風(fēng)扇/液冷泵
保持腔體內(nèi)溫度均勻性與穩(wěn)定性
英文資料:
TEL Tokyo Electron 2L80-000212-13 Driver Module
Type: Driver Module/Actor Driver
Manufacturer: Tokyo Electron Ltd. (TEL)
1、 Product Function Overview
The 2L80-0000212-13 driver is a control module used for executing components in semiconductor equipment, such as motors, solenoid valves, linear actuators, etc. It mainly performs the following functions:
Receive control signals from the main control system or embedded processor
Amplify control signals to drive high-power loads (such as servo motors, stepper motors)
Provide precise speed control, position control, or torque control
Implement closed-loop feedback control and operate in conjunction with sensor modules
Equipped with electrical protection functions, such as overload, overvoltage, and overcurrent protection
2、 Typical application areas
1. Wafer Transfer Module
Drive vacuum manipulator, rotating arm, Z-axis lifting platform and other devices
Realize precise wafer handling, alignment, loading and unloading
2. Vacuum chamber action control system
Control the opening and closing actions of vacuum valves, positioning mechanisms, or drive motors for chamber doors
Support multi-point positioning and closed-loop feedback to enhance cavity safety and reliability
3. Valve controlled driving in chemical vapor deposition (CVD) or etching systems
Drive gas proportional control valve, solenoid valve or switching valve
Accurately adjust gas flow rate, ratio, and response timing
4. Cooling or heating platform drive device
Drive heat sink, cold plate adjustment components or fans/liquid cooling pumps
Maintain temperature uniformity and stability inside the cavity
2.產(chǎn) 品 展 示
3.其他產(chǎn)品
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