TEL Tokyo Electron 381-640994-2控制單元 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
一、基本信息
產(chǎn)品型號：381-640994-2
產(chǎn)品名稱：控制單元（Control Unit）
制造商：Tokyo Electron Limited（TEL）
部件類別：主控制或分布式控制模塊
版本號：-2（代表該控制單元的特定硬件修訂）
二、主要功能
該控制單元是 TEL 半導(dǎo)體設(shè)備中的核心控制組件之一，通常承擔(dān)以下任務(wù)：
| 功能分類 | 說明 |
|---|---|
| 設(shè)備主控 | 處理來自上位系統(tǒng)的命令，控制設(shè)備運(yùn)行流程和執(zhí)行狀態(tài) |
| 信號協(xié)調(diào) | 管理并協(xié)調(diào)多個(gè)輸入/輸出模塊的數(shù)據(jù)傳輸與控制指令 |
| 工藝邏輯控制 | 根據(jù)預(yù)設(shè)工藝步驟，發(fā)出啟動、加熱、真空、氣體流等動作控制 |
| 通信橋接 | 連接 HMI、上位機(jī)、傳感器和執(zhí)行器等模塊，實(shí)現(xiàn)數(shù)據(jù)交互 |
| 故障處理 | 檢測異常狀態(tài)并觸發(fā)報(bào)警、停機(jī)或自保護(hù)機(jī)制 |
三、典型應(yīng)用領(lǐng)域
此類控制單元廣泛用于 TEL 的晶圓處理設(shè)備中，具體包括：
光刻前后處理設(shè)備（如 Clean Track ACT 系列）
控制顯影臂動作、升降臺、噴涂系統(tǒng)和干燥加熱單元等CVD / Etch 系統(tǒng)（如 Tactras、Trias 系列）
管理溫度、真空、氣體控制回路等復(fù)雜工藝子系統(tǒng)搬運(yùn)/真空系統(tǒng)（Loadport / Transfer Modules）
協(xié)調(diào)機(jī)械手、腔體門、氣密系統(tǒng)等模塊的動作時(shí)序和互鎖邏輯
英文資料：
1、 Basic Information
Product model: 381-640994-2
Product Name: Control Unit
Manufacturer: Tokyo Electron Limited (TEL)
Component category: Main control or distributed control module
Version number: -2 (representing specific hardware revisions for this control unit)
2、 Main functions
This control unit is one of the core control components in TEL semiconductor equipment, typically responsible for the following tasks:
Functional classification description
The device master controls the operation process and execution status of the device by processing commands from the upper system
Signal coordination management and coordination of data transmission and control instructions for multiple input/output modules
Process logic control: Based on preset process steps, control actions such as startup, heating, vacuum, gas flow, etc. are issued
Communication bridging connects modules such as HMI, upper computer, sensors, and actuators to achieve data exchange
Fault handling detects abnormal states and triggers alarm, shutdown or self-protection mechanisms
3、 Typical application areas
This type of control unit is widely used in TEL's wafer processing equipment, including:
Photolithography pre-processing and post-processing equipment (such as Clean Track ACT series)
Control the action of the developing arm, lifting platform, spraying system, and drying heating unit, etc
CVD/Etch systems (such as Tactras, Trias series)
Manage complex process subsystems such as temperature, vacuum, and gas control circuits
Loading port/Transfer modules
Coordinate the action timing and interlock logic of modules such as robotic arms, chamber doors, and airtight systems
2.產(chǎn) 品 展 示
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