TEL Tokyo Electron 3D81-00004-15傳感器模塊 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
TEL Tokyo Electron 3D81-00004-15 傳感器模塊（Sensor Module） 是Tokyo Electron半導體設(shè)備中的關(guān)鍵電子模塊，用于采集和處理設(shè)備中的各類傳感器信號，支持設(shè)備工藝參數(shù)的精準監(jiān)控與反饋。
一、基本信息
產(chǎn)品名稱：傳感器模塊
型號：3D81-00004-15
制造商：Tokyo Electron Ltd. (TEL)
模塊類型：傳感器信號采集與處理模塊
應(yīng)用領(lǐng)域：廣泛應(yīng)用于半導體制造設(shè)備如刻蝕、沉積、清洗及搬運系統(tǒng)
二、主要功能
多類型傳感器信號采集
接收溫度、壓力、流量、真空度等模擬信號；
支持數(shù)字傳感器信號輸入。
信號調(diào)理與轉(zhuǎn)換
對傳感器信號進行濾波、放大、數(shù)字轉(zhuǎn)換等處理，確保數(shù)據(jù)準確穩(wěn)定。
數(shù)據(jù)傳輸與反饋
將處理后的信號傳輸至主控系統(tǒng)，用于工藝控制和設(shè)備狀態(tài)監(jiān)測。
異常檢測與報警聯(lián)動
支持超限報警功能，保證設(shè)備安全運行。
三、典型應(yīng)用領(lǐng)域
刻蝕設(shè)備：監(jiān)測腔體內(nèi)氣體壓力、溫度及等離子體參數(shù)。
CVD/ALD沉積設(shè)備：監(jiān)控腔體溫度、氣流及化學氣體濃度。
晶圓清洗系統(tǒng)：檢測化學液濃度、液位及泵狀態(tài)。
搬運機械：傳感器狀態(tài)監(jiān)控，保障機械手動作精度與安全。
英文資料：
The TEL Tokyo Electron 3D81-00004-15 Sensor Module is a key electronic module in Tokyo Electron semiconductor equipment, used to collect and process various sensor signals in the equipment, supporting precise monitoring and feedback of equipment process parameters.
1、 Basic Information
Product Name: Sensor Module
Model: 3D81-00004-15
Manufacturer: Tokyo Electron Ltd. (TEL)
Module type: Sensor signal acquisition and processing module
Application areas: Widely used in semiconductor manufacturing equipment such as etching, deposition, cleaning, and handling systems
2、 Main functions
Multi type sensor signal acquisition
Receive analog signals such as temperature, pressure, flow rate, vacuum degree, etc;
Support digital sensor signal input.
Signal conditioning and conversion
Filter, amplify, and convert sensor signals to ensure accurate and stable data.
Data transmission and feedback
Transmit the processed signal to the main control system for process control and equipment status monitoring.
Abnormal detection and alarm linkage
Support over limit alarm function to ensure safe operation of equipment.
3、 Typical application areas
Etching equipment: Monitor gas pressure, temperature, and plasma parameters inside the chamber.
CVD/ALD deposition equipment: monitors chamber temperature, gas flow, and chemical gas concentration.
Wafer cleaning system: detects chemical concentration, liquid level, and pump status.
Handling machinery: Sensor status monitoring to ensure the accuracy and safety of robotic arm movements.
2.產(chǎn) 品 展 示
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